As technology migrates from 90 nm to 65 nm and, eventually, to the 45-nm node, fast yield ramp-up is increasingly difficult to achieve due to the sub-wavelength effects of lithography. While minimum ...
Abstract: This application note discusses ways to help system designers apply proper layout techniques and signal routing. The layout and component descriptions will minimize noise pick-up and manage ...
As integrated circuit (IC) designs continue to scale, the demand for efficient power management, performance optimization and reliable physical layout modification grows more critical. Meeting these ...
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