KYOTO, Japan--(BUSINESS WIRE)--On April 20, 2018, SCREEN Semiconductor Solutions Co., Ltd. (SCREEN) signed a memorandum of understanding (MoU) with National Tsing Hua University (NTHU) in a ceremony ...
The eBeam initiative celebrated its 15 th anniversary at the recent SPIE Advanced Lithography + Patterning Conference. 130 members of the mask and lithography community attended the annual lunch to ...
KemLab Inc., a pioneering developer of advanced materials for microelectronics and MEMS applications, is pleased to offer a high-quality solution tailored to address the requirements of ...
SAN JOSE, Calif. — Amid a major expansion plan, Japan's e-Shuttle Inc. is moving to improve its direct-write e-beam capabilities. It is also exploring the future use of next-generation maskless ...
LONDON — Genisys GmbH has produced a Windows application called Layout Beamer 2.0 that supports microstructure fabrication using electron beam lithography. Genisys (Munich, Germany) said that Layout ...
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